Title: Photomask blanks
Application Number: 97196087 Application Date: 1997.06.30
Publication Number: 1224513 Publication Date: 1999.07.28
Approval Pub. Date: 2003.10.15 Granted Pub. Date: 2003.10.15
International Classifi-cation: G03F1/00
Applicant(s) Name: E. I. Du Pont de Nemours Address:
Inventor(s) Name: R. H. French;K. G. Sharp
Attorney & Agent: lu xinhua
Abstract:
    Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1.2 to 2.0, preferably in the range from 1.26 to 1.8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0.04 to 0.8, preferably in the range from 0.06 to 0.59 at the selected lithographic wavelength below 400 nm.
Time: 10