Title: Method and appts. for development of resist
Application Number: 97190887 Application Date: 1997.07.03
Publication Number: 1197518 Publication Date: 1998.10.28
Approval Pub. Date: 2004.01.07 Granted Pub. Date: 2004.01.07
International Classifi-cation: G03F7/30
Applicant(s) Name: Seiko Epson Corp. Address:
Inventor(s) Name: Gomi Tsugio
Attorney & Agent: wang yonggang
Abstract:
    A development method and a development apparatus which improve the patterning precision of the resist development and avoid retardation and complexity of the development work in a lithography process. Said method and apparatus comprise: a developing bath (20) in which developer (22) is stored; guides (14 and 16) which introduce a flexible film (12) into the developing bath (20) which is coated with photoresist and exposed so as to dip the film (12) in the developer (22); and a pump (26) which applies a liquid pressure of the developer (22) to the flexible film (12) dipped in the developer (22) through outlets (28a).
Time: 8
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