Title: Positive photoresist composition containing a 2,4-dinitro-1-naphthol
Application Number: 97197072 Application Date: 1997.08.06
Publication Number: 1227637 Publication Date: 1999.09.01
Approval Pub. Date: 2002.12.04 Granted Pub. Date: 2002.12.04
International Classifi-cation: G03F7/022;G03F7/09
Applicant(s) Name: Clariant International Co., Ltd. Address:
Inventor(s) Name: Lu Ping-Hung;R. R. Damel;E. G. Kokinda
Attorney & Agent: chen jizhuang
Abstract:
    A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
Time: 12