Title: Liquid antireflective coating for photoresist compositions
Application Number: 97197298 Application Date: 1997.08.15
Publication Number: 1228172 Publication Date: 1999.09.08
Approval Pub. Date: 2003.06.18 Granted Pub. Date: 2003.06.18
International Classifi-cation: G03F7/09
Applicant(s) Name: Clariant International Co., Ltd. Address:
Inventor(s) Name: D. L. Durham;I. Mcculloch;R. R. Dammel
Attorney & Agent: chen jizhuang
Abstract:
    The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a cross-linking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.
Time: 5