Title: Antireflective coatings for photoresist resin compositions
Application Number: 97197198 Application Date: 1997.08.15
Publication Number: 1227638 Publication Date: 1999.09.01
Approval Pub. Date: 2004.05.05 Granted Pub. Date: 2004.05.05
International Classifi-cation: G03F7/09
Applicant(s) Name: Clariant International Co., Ltd. Address:
Inventor(s) Name: D. L. Durham;I. Mcculloch;R. R. Dammel
Attorney & Agent: ren zonghua
Abstract:
    The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
Time: 6