Title: Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity
Application Number: 97197557 Application Date: 1997.08.22
Publication Number: 1228851 Publication Date: 1999.09.15
Approval Pub. Date: 2004.01.07 Granted Pub. Date: 2004.01.07
International Classifi-cation: G03F7/004
Applicant(s) Name: CIBA Specialty Chemicals Holding Inc. Address:
Inventor(s) Name: K. Dietliker;M. Kunz;H. Yamato
Attorney & Agent: wu yuhe
Abstract:
    The invention describes the use of oxime alkyl sulfonate compounds of formula (1), wherein R is naphthyl, (2) or (3); R0 is either an R1-X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4 alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chlorin, bromine, C1-C4 alkyl and C1-C4 alkyloxy; R2 is hydrogen or C1-C4 alkyl; and R3 is straight-chain or branched C1-C12 alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosentisitve acid generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
Time: 7