Title: Antireflective coating for photoresist compositions
Application Number: 97198410 Application Date: 1997.09.26
Publication Number: 1232552 Publication Date: 1999.10.20
Approval Pub. Date: 2003.06.18 Granted Pub. Date: 2003.06.18
International Classifi-cation: G03C1/835;G03F7/09
Applicant(s) Name: Clariant International Ltd. Address:
Inventor(s) Name: I. Mcculloch;R. R. Dammel;A. J. Corso
Attorney & Agent: chen jizhuang
Abstract:
    The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
Time: 7