| Title: | Photosensitive composition and use thereof | ||
| Application Number: | 97198548 | Application Date: | 1997.10.02 |
| Publication Number: | 1232549 | Publication Date: | 1999.10.20 |
| Approval Pub. Date: | 2004.02.11 | Granted Pub. Date: | 2004.02.11 |
| International Classifi-cation: | G03F7/033;H01J9/227 | ||
| Applicant(s) Name: | Sanyo Chemical Industries, Ltd. | Address: | |
| Inventor(s) Name: | Ogiso Naohito;Watanabe Tetsuga;Yamada Tetsuya | ||
| Attorney & Agent: | bai yihua | ||
|
|
|
||
Abstract: |
|||
| The present invention relates to a photosensitive composition suitable for forming black matrix screens and fluorescent screens of color cathode-ray tubes and having such a high photosensitivity as to enable a remarkable shortening of the exposure time and a high stability even after the lapse of time. The composition comprises 70 to 99 % by weight of a vinylic polymer (A) having repeating units derived from a monomer (a) which is represented by the general formula (1): H2C=CH-X-Q and wherein the functional group Q has a frontier-electron density as defined by the following equation of at least 0.067 and 30-1 % by weight of a photosensitive compound (B) comprising azide and/or diazo compounds: frontier-electron density = 2 * (coefficient of atomic orbital of lowest vacant orbital) | |||
|
|
|||
| Time: | 5 | ||
<- Previous Patent:Bottom antireflective coatings co...
| Next Patent:Chemically amplified resist compo... ->
|
|||