Title: Method for reducing metal in contaminants in photoresist compositions containing an organic polar solvent by ion exchange
Application Number: 97181389 Application Date: 1997.12.16
Publication Number: 1244930 Publication Date: 2000.02.16
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G03F7/004;G03F7/022
Applicant(s) Name: Clariant International Ltd. Address:
Inventor(s) Name: M. D. Rahman
Attorney & Agent: chen jizhuang
Abstract:
    The present invention provides methods for producing a photoresist composition with extremely low level of metals contamination utilizing cleaned cationic ion exchange resin and anionic ion exchange resin, wherein the photoresist composition contains a polar solvent. A method is also provided for producing semiconductor devices using such photoresist compositions.
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