Title: Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
Application Number: 97181410 Application Date: 1997.12.16
Publication Number: 1244876 Publication Date: 2000.02.16
Approval Pub. Date: 2003.09.03 Granted Pub. Date: 2003.09.03
International Classifi-cation: C08G8/08;G03F7/023
Applicant(s) Name: Clariant International Ltd. Address:
Inventor(s) Name: M. D. Rahman;D. P. Aubin
Attorney & Agent: chen jizhuang
Abstract:
    The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins fractions having consistent molecular weight and superior performance in photoresist composition, by fractionating novolak resins according to molecular weight. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.
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