Title: Fractionated novolak resin from cresol-formaldehyde reaction mixture and photo resist composition therefrom
Application Number: 97181409 Application Date: 1997.12.16
Publication Number: 1244875 Publication Date: 2000.02.16
Approval Pub. Date: 2003.05.14 Granted Pub. Date: 2003.05.14
International Classifi-cation: C08G8/08;G03F7/023
Applicant(s) Name: Clariant International Ltd. Address:
Inventor(s) Name: M. D. Rahman;Lu Ping-Hung;M. Cook
Attorney & Agent: chen jizhuang
Abstract:
    The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
Time: 6