Title: Electron beam exposure of subpatterns of pattern
Application Number: 97121721 Application Date: 1997.12.17
Publication Number: 1186328 Publication Date: 1998.07.01
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G03F7/20;H01L21/30
Applicant(s) Name: NEC Corp. Address:
Inventor(s) Name: Ken Nakajima
Attorney & Agent: mu dejun
Abstract:
    In a method of drawing patterns by an electron beam exposure apparatus, a target pattern is divided into subpatterns and one of the subpatterns is sequentially selected. The dimensions of the selected subpattern are compared with dimensions of a reference electron beam which are determined in accordance with design dimensions. When at least one of the dimensions of the selected subpattern is not larger than the corresponding one of the dimensions of the reference electron beam, dimensions of the use electron beam for the selected subpattern are estimated. Also, the use exposure quantity for the selected subpattern is determined based on the estimated dimensions of the use electron beam for the selected subpattern. Then, the use electron beam is irradiated to the subpattern with the use exposure quantity.
Time: 8