| Title: | Photogeneration of amine by using alpha-amino acetophenone | ||
| Application Number: | 98103997 | Application Date: | 1998.01.19 |
| Publication Number: | 1209442 | Publication Date: | 1999.03.03 |
| Approval Pub. Date: | 2002.06.19 | Granted Pub. Date: | 2002.06.19 |
| International Classifi-cation: | A61K6/08;C08K5/16;C09D4/00;G03F7/00;G03G5/00 | ||
| Applicant(s) Name: | Ciba SC Holding AG | Address: | |
| Inventor(s) Name: | J. L. Birbarm;M. Kuntz;A. Kimura | ||
| Attorney & Agent: | liu jinhui | ||
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Abstract: |
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| Compounds of formula I, II or III X is a divalent radical; Y is C1-C6 aklylene, cyclohexylene or a direct bond; Ar1 is an aromatic radical as defined in claim 1, R1 and R2 are each independently the other, inter alia, a radical of formula in which p is zero or 1, or a radical of formula R3 is, inter alia, hydrogen, C1-C12alkyl, C5-C12cycloalkyl or phenyl-C1-C3alkyl; R4 is, inter alia, C1-C12cycloalkyl, phenyl-C1-C3alkyl or phenyl; or an acid addition salt of a compound of formula I, II or III; are useful as photosensitive base catalysts in base crosslinking compositions. | |||
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| Time: | 12 | ||
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