Title: Projection exposure device and method, amplitude image diffirence appraising method and image diffirence eliminating light filter
Application Number: 98103875 Application Date: 1998.02.19
Publication Number: 1204071 Publication Date: 1999.01.06
Approval Pub. Date: 2004.12.08 Granted Pub. Date: 2004.12.08
International Classifi-cation: G02B17/08;G03F7/20
Applicant(s) Name: Mitsubishi Denki K. K. Address:
Inventor(s) Name: Kamon Kazuya
Attorney & Agent: jiang fuhou
Abstract:
    A projection aligner capable of compensating for the transmittance distribution in a projection optical system, without three-dimensional interference or deterioration in the imaging characteristics. This projection aligner has a projection optical system 6, which forms on a substrate to be aligned 21 an image of a diffracted light from a photomask 20 illuminated with an illuminating light from a lamp house 11, thereby projecting a circuit pattern. This optical system 6 has first and second half-mirrors 1, 3 and first and second concave mirrors 2, 4. In this case, the mirrors 1, 3 are disposed to be symmetric with or similarly-symmetric with the optical axis of the diffracted light from the first half-mirror 1 to the second half-mirror 3.
Time: 7