Title: Liquid photoresist
Application Number: 98111154 Application Date: 1998.02.24
Publication Number: 1227354 Publication Date: 1999.09.01
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G03F7/00
Applicant(s) Name: Zhu Liu Address: 214035
Inventor(s) Name: Zhu Liu, Shen Wei
Attorney & Agent: chen jianhe
Abstract:
     The liquid photoresist is prepared by compounding UV-curable soda lye-soluble resin 40-80 wt%, acrylic ester or other photoset resin 15-30 wt%, multifunctional acrylic ester photocross-linking agent 5-20 wt%, optical initiator 1-3 wt%, and other material. These optically set materials produce photo-setting reaction after being irradiated by UV. Through soda lye development to eliminate unsensitized parts, the image is formed. The present invention may be used in producing printed circuit board and has excellent effect.
Time: 7