| Title: | Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates | ||
| Application Number: | 200480041556 | Application Date: | 2004.02.11 |
| Publication Number: | 1914558 | Publication Date: | 2007.02.14 |
| Approval Pub. Date: | Granted Pub. Date: | ||
| International Classifi-cation: | G03C1/73;G03F7/039;G03F7/20;G03F7/30 | ||
| Applicant(s) Name: | IBM | Address: | |
| Inventor(s) Name: | Moreau Wayne M;Angelopoulos Marie;Huang Wu-Song;Me | ||
| Attorney & Agent: | liu menghai | ||
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Abstract: |
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| Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making. | |||
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| Time: | 8 | ||
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