Title: Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
Application Number: 200480030777 Application Date: 2004.10.20
Publication Number: 1871549 Publication Date: 2006.11.29
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G03C1/73,G03F7/039,G03F7/20,G03F7/30,G03F7/32
Applicant(s) Name: Univ North Carolina Address:
Inventor(s) Name: Desimone Joseph M., Zannoni Luke, Hicks Evan
Attorney & Agent: zhao sulin
Abstract:
     The present invention provides a compound that is a terpolymer of: (a) at least one ethylenically unsaturated linear or branched compound that has at least one fluorine atom covalently coupled thereto; (b) at least one ethylenically unsaturated precursor of a cyclic or polycyclic compound that has at least one fluorine atom covalently coupled thereto forming a cyclic or polycyclic decrystallizing monomer in said terpolymer; and (c) at least one ethylenically unsaturated functional compound which as a monomer in said terpolymer changes solubility upon exposure to an acid or base. Methods of making and using such compounds in photolithography are also described.
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