| Title: | Method for forming an array of thin film actuated mirrors | ||
| Application Number: | 95104788 | Application Date: | 1995.05.04 |
| Publication Number: | 1123917 | Publication Date: | 1996.06.05 |
| Approval Pub. Date: | 2001.05.16 | Granted Pub. Date: | 2001.05.16 |
| International Classifi-cation: | G02B27/18;G02F1/01 | ||
| Applicant(s) Name: | Daewoo Electronics Co., Ltd. | Address: | |
| Inventor(s) Name: | Yong Ki Min | ||
| Attorney & Agent: | JIAN WEI | ||
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Abstract: |
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| A method for forming an array of thin film actuated mirrors for use in an optical projection system comprises the steps of: (a) providing a base; (b) depositing a separation layer on top of the base; (c) forming a first an electrodisplacive, a second, an elastic and a sacrificial layers successively on top of the separation layer; (d) forming an array of MxN supporting members, each thereof having a conduit; (e) patterning to form an array of multilayered actuated mirror structures; (f) attaching an active matrix included therein an array of transistors to the array of multilayered actuated mirror structures; (g) separating the base to form said array of thin film actuated mirrors. In the inventive method, the heat treatment of the electrodisplacive layer is carried out prior to the attaching of the active matrix, thereby preventing the transistors from being degraded by the heat. | |||
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| Time: | 12 | ||
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