Title: Aid device for inspection system and display method therefor
Application Number: 200510072712 Application Date: 2005.05.17
Publication Number: 1699935 Publication Date: 2005.11.23
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G01H17/00;G01M19/00
Applicant(s) Name: Omron Tateisi Electronics Co. Address:
Inventor(s) Name: Hori Masaki
Attorney & Agent: ma ying shao yali
Abstract:
    This invention provides an intelligent preparation support system allowing a user to determine efficiently a feature quantity and/or a parameter optimum to an inspection device. A computed result found by computing the feature quantity as to a prescribed combination of the set feature quantity and parameter is acquired in a waveform data acquired from an inspection object. Then, a graph using the set feature quantity and parameter as an ordinate and an abscissa is displayed based on the acquired computed result. Each area on the graph is indicated by a concentration corresponding to the computed result in every combination of the ordinate and the abscissa. The user is able to find easily the area of high concentration, by indicating the concentration, and a condition such as the combination of the feature quantity and the parameter optimum to the waveform data acquired from the inspection object is easily found by observing the combination of the feature quantity and the parameter corresponding to the area.
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