Title: Inspection method and inspection apparatus
Application Number: 200610057425 Application Date: 2006.03.15
Publication Number: 1834607 Publication Date: 2006.09.20
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G01M19/00,G01H17/00
Applicant(s) Name: Omron Tateisi Electronics Co. Address:
Inventor(s) Name: Kojitani Kazuto, Shimizu Atsushi
Attorney & Agent: huang lunwei
Abstract:
     The invention relates to a detect device and relative detect method, which can detect according to different worse condition. Wherein, said detect device is used to execute for processing abnormal judgment, based on the mode of normal data from the good product, while it has the function that judge the quality based on variable judgment mode and the function that judge quality based on the non-variable judgment mode; when the sample data is not enough, or the distribution of good product in character space is instable, with not enough estimate accuracy on the shape of normal area, it executes the judgment based on the judge mode of opposite objects, and processes the final judgment according to the result; when the sample data is enough, the distribution of good product, and the shape of normal area are stable, it executes judgment only based on the parameter judge mode.
Time: 10