Title: Inspection apparatus, aid device for creating judgement model therefor, abnormality detection device for endurance test apparatus and endurance test method
Application Number: 200610059193 Application Date: 2006.03.15
Publication Number: 1847820 Publication Date: 2006.10.18
Approval Pub. Date: Granted Pub. Date:
International Classifi-cation: G01M19/00,G01H17/00
Applicant(s) Name: Omron Tateisi Electronics Co. Address:
Inventor(s) Name:
Attorney & Agent: guo dinghui huang xiaolin
Abstract:
     An endurance test is carried out after judgment models are created from normal data obtained from test apparatus while operating stably and presence and absence of abnormality in a target object is judged from waveform data obtained during the test and by using the created judgment models. An aid device creates such judgment models automatically by creating divided waveform data by dividing obtained waveform data into portions of unit time, obtaining characteristic quantities in units of the divided waveform data based on a plurality of the divided waveform data for the unit time. The judgment models are created for the unit time based on the obtained characteristic quantities.
Time: 14
<- Previous Patent:Inspection method and inspection ...   |  Next Patent:Knock sensor ->