Polymerisable composition Compounds of formula (I), wherein X is CH, C-CH3, C-Cl, C-O-C1-C8alkyl or N; R is C1-C6alkyl, benzyl, CH2COOR3 or a group (a); R1 is C1-C8alkoxy, C1-C12alkyl, halogen, NO2, benzyloxy or p...
2
97110797
Management device of photoetching film stripping liquid In a semiconductor manufacturing process or a liquid crystal board manufacturing process, a resist stripping solution blending an organic alkali and an organic solvent is used for strippi...
3
97103587
Etching method for forming images on granite material
A method for forming image on granite material by etching includes such steps as making negative film, making silk screen plate, printing protecting layer, etching and filling pigments, ...
4
97110135
Method of facsimiling and etching figure on marble
The facsimiling and etching processes include negative plate production, silk screen plate production, printing figure protecting layer on marble, etching, filling pigment and others. It...
5
97194798
Attenuating embedded phase shift photomask blanks Attenuating embedded phase shift photomask blanks capable of producing a 180 DEG phases shift with an optical transmissivity of at least 0.0001 at wavelengths
6
97194799
Attenuating embedded phase shift photomask blanks Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180 DEG and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths
Heat-sensitive plate-making paper
Of the said heat-sensitive plate-making paper, the resin in heat-sensitive adhesion layer is vinyl chloride-vinyl acetate copolymer resin in the compound ratio of 65/35 to 55/45 and with...
Photopolymerizable thermosetting resin composition A photopolymerizable thermosetting resin composition comprising a mixture consisting of (a) an active energy ray-setting resin and obtained by reacting an unsaturated monobasic acid copol...
Photomask blanks Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluo...
19
97190887
Method and appts. for development of resist A development method and a development apparatus which improve the patterning precision of the resist development and avoid retardation and complexity of the development work in a lithogr...
20
97111920
Precoating sensitive plate and its prodn. method
A pre-coated negative photosensitive plate is composed of substrate, diazotized photosensitive resin and three-component filming resin. When it is being radiated by ultraviolet ray, phot...
Illumination unit for an optical apparatus Illumination unit (2) for an optical system, including an illumination system (1) which comprises, in this order, a radiation source (3) and a first optical integrator (11). The illuminat...
Liquid antireflective coating for photoresist compositions The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polym...
29
97116763
Charged-beam exposure mask and charged-beam exposure method An electron-beam exposure mask includes a substrate with a first area and a second area, a first plurality of cell apertures formed in the first area of the substrate, and a second plural...
30
97197198
Antireflective coatings for photoresist resin compositions The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and a...
Transfer method and active matrix base board mfg. method
A transferring method including providing a substrate, forming a transferred layer over the substrate, joining a transfer member to the transferred layer, and removing the transferred la...
34
97199401
Liquid curable resin composition A liquid curable resin composition comprising (1) a (meth)acrylate polymer having a weight average molecular weight relative to polystyrene standard of at least about 5,000, (2) a ring-op...
Soldering resist compsn. and printed wiring board
A solder resist composition comprises an acrylate of novolac type epoxy resin and an imidazole curing agent and has a viscosity of 0.5-10 Ps.s adjusted with glycol ether type solvent. A ...
37
97182380
Optical lithography beyond conventional resolution limits
Optical lithography scheme making use light coupling structures, and elastomeric light coupling structures in particular. These light coupling structures comprise protruding portions and...
38
97198409
Light sensitive composition contg. arylhydrazo dye A light-sensitive positive photoresist composition containing a film forming resin, a photoactive compound, a solvent, and an arylhydrazo dye. The dyed photoresist reduces the linewidth v...
39
97198410
Antireflective coating for photoresist compositions The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and a...
40
97198408
Bottom antireflective coatings contg. arylhydrazo dye The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a polymer, a novel ar...
41
97122568
Chemically amplified resist composition Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 alipha...
42
97198548
Photosensitive composition and use thereof The present invention relates to a photosensitive composition suitable for forming black matrix screens and fluorescent screens of color cathode-ray tubes and having such a high photosens...
43
97121517
Photosensitive film laminating machine for mfg. lead frame The photosensitive film laminating equipment of the invention includes one basic frame having an entry to pass through a sheet consecutively in its front side; a preheating unit installed...
Pressure-developing device and recording device A pressure developing unit moving along a surface of a cycolor medium to perform pressure development has a first rotating member that faces a platen and is capable of performing pressure...
46
01117665
Expoure method and equipment producing method Two stages WS1, WS2 holding wafers can independently move between a positional information measuring section PIS under an alignment system 24a and an exposing section EPS under a projecti...
47
97181117
Aligner and method for exposure Two stages WS1, WS2, each of which supports a wafer, can individually move between a position information measuring section PIS below an alignement system 24a and an exposure section EPS ...
48
01121642
Exposure device Two stages WS1, WS2 holding wafers can independently move between a positional information measuring section PIS under an alignment system 24a and an exposing section EPS under a projecti...
49
200610004900
Projection exposure apparatus
Two stages (WS1, WS2), each of which supports a wafer, can individually move between a position information measuring section (PIS) below an alignement system (24a) and an exposure secti...
50
01117666
Exposure apparatus and exposure method Two stages WS1, WS2 holding wafers can independently move between a positional information measuring section PIS under an alignment system 24a and an exposing section EPS under a projecti...
51
01121643
Photoetching device and exposure method Two stages WS1, WS2 holding wafers can independently move between a positional information measuring section PIS under an alignment system 24a and an exposing section EPS under a projecti...
52
97122191
Method and apparatus for producing printing stencil The manufacturing method involves using illumination of a light-sensitive layer applied to the printing template base plate via a liquid crystal display device (16). This device can be mo...
Process and apparatus for the coating of boards In a process for the coating of boards (4) with a poured material (L), especially for the coating of printed circuit boards with, for example, solder resist, the boards (4) to be coated a...
Electron beam exposure of subpatterns of pattern In a method of drawing patterns by an electron beam exposure apparatus, a target pattern is divided into subpatterns and one of the subpatterns is sequentially selected. The dimensions of...
61
97180838
Method of contact printing on gold coated films The present invention relates to methods of contact printing of patterned, self-assembling monolayers of alkanethiolates, carboxylic acids, hydroxamic acids, and phosphonic acids on metal...
62
97125722
Radiation sensitive composition adapted for roller coating A radiation sensitive composition adapted for roller coating is disclosed, wherein a solvent is a mixed solvent including 20% by weight or less of propylene glycol and/or dipropylene glyc...
63
97125721
Radiation-sensitive composition adapted for roller coating A radiation-sensitive composition adapted for roller coating is disclosed, which contains, as a solvent for the composition, a mixed solvent of at least one member selected from the group...
Method and device using arf photoresist A photoresist includes a copolymer of bicycloalkene derivatives with maleic anhydride and/or vinylene carbonate, and has a molecular weight of 3000 to 100,000. The photoresist can be used...
67
97126153
Method and device using ArF photoresist A photoresist includes a copolymer of one or more bicycloalkene derivatives with maleic anhydride and/or vinylene carbonate, and has a molecular weight of 3000 to 100,000. The photoresist...
68
97123495
Semiconductor device and method for manufacturing the same
A first resist pattern, which is capable of generating an acid, is formed on a semiconductor device layer. Over the first resist pattern, a layer of a second resist, which is capable of ...
69
03106352
Photoetch resist copolymer
A photoresist includes a copolymer of bicycloalkene derivatives with maleic anhydride and/or vinylene carbonate, and has a molecular weight of 3000 to 100,000. The photoresist can be use...
70
98100324
Method and device using ArF photoresist A novel photoresist copolymer, consisting of at least two aliphatic cyclo-olefins and an amine, which is useful for the photolithography using ArF as a light source. The photoresist prepa...
71
98103997
Photogeneration of amine by using alpha-amino acetophenone Compounds of formula I, II or III X is a divalent radical; Y is C1-C6 aklylene, cyclohexylene or a direct bond; Ar1 is an aromatic radical as defined in claim 1, R1 and R2 are each indepe...
72
98801985
Non-volatile phenylglyoxalic esters The present invention relates to compounds of formula(I)in which R1 and R2 independently of one another are, for example, a group of formula(II); R3, R4, R5, R6 and R7 independently of on...
73
98100386
Drawing producing method
The netted positives produced in color splitting machine according to the sample are covered onto photo film successively for exposure and the photo film is colored with pigment powder w...
74
98804092
Photocurable resin composition A photocurable resin composition which comprises: (A) a urethane (meth)acrylate oligomer obtained by the reaction of (a) at least one polyol compound preferably selected from the group co...
75
98106191
Electroconductive copper paste composition An electroconductive copper paste composition comprising a copper powder, a thermosetting resin and a solvent as essential components, characterized in that the copper powder has a dendri...
76
98105309
Positive-tone photoimageable crosslinkable coating The invention relates to the imaged portion of a positive-tone photoimageable dielectric coating composition, which comprising a combination of a novolac resin and a naphthoquinonediazide...
Photomask for use in exposure and method for producing same An exposure photomask which transfers a desired pattern onto a semiconductor substrate S, which has a step, has a region formed by a light-blocking film and a region formed by a transluce...
80
98803148
Photoactive coumarin sulfonate compound A new class of 3-diazo-3,4-dihydrocoumarin compounds which are useful as photoactive compounds in a wide variety of applications including photoresists and other opto-electronic applicati...
81
98803156
Process for preparing photoactive coumarin derivatives Novel processes for the preparation of a new class of coumarin derivatives, which are useful as photoactive compounds in a wide variety of applications including photoresists and other op...
82
98111154
Liquid photoresist
The liquid photoresist is prepared by compounding UV-curable soda lye-soluble resin 40-80 wt%, acrylic ester or other photoset resin 15-30 wt%, multifunctional acrylic ester photocross-l...
Photosensitive quinolone compounds and process of preparation The present invention relates to novel photosensitive quinolone compounds, specifically novel 3-diazo 2,4-quinolinedione compounds, that may be used in a variety of applications, such as,...
85
98804069
Ternary photoinitiator system for curing of epoxy resins Photocurable, addition polymerizable compositions contain an epoxy resin and a photoinitiator system containing (a) an epoxy resin and (b) a photoinitiator system comprising: (i) an iodon...
Photoactivatable nitrogen-contg. based on alpha-amino alkenes The invention relates to organic compounds having a molecular weight of less than 1000 comprising at least one structural unit of formula (I), in which R1 is an aromatic or heteroaromatic...
Chemically amplified resist To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by preventing problem of T-shaped resist pattern and reinforcing exposure depen...
90
98106936
Production of photosensitive recording material A process for the production of a photosensitive recording material for producing relief printing plates is described, in which a photosensitive layer is laminated with a composite elemen...
91
98800363
Imaging device, imaging method and printing device An imaging device (1) having a plurality of beam projecting sources which can be independently driven; an imaging method; an optical fiber array device; an imaging head device; and a prin...
Apertured nonplanar electrodes and forming methods Positional accuracy of apertures in nonplanar electrodes is improved with a new fabrication method. This method precedes process steps which establish a photoresist pattern that defines a...
Light absorbing polymers The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer compri...
100
98115088
Partial collective mask for charged particle beam A partial collective mask for charged particle beam exposure of the present invention is capable of being easily reshaped in order to obviate snapping, defective contact draw and other cr...
