Match Application Number Document Title
1 200710004236 Plasma processing apparatus and method
The invention provides a plasma processing system characterised in that comprises a processing container for receiving a substrate to be processed and performing vacuum exhausting air; a ...
2 200710004237 Plasma processing apparatus and method
The invention provides a plasma processing system characterised in that comprises a processing container for receiving a substrate to be processed and performing vacuum exhausting air; a ...
3 200610001492 Substrate processing apparatus and substrate processing method
A substrate processing apparatus that enables a plurality of substrates to be subjected to stable plasma processing. A chamber 11 houses a wafer W. The wafer W is subjected to reactive i...
4 200610001645 Apparatus and method for treating semiconductor device with plasma
A semiconductor plasma-processing apparatus smoothes effects of side radical-concentration, which are frequently generated by inductive-coupling plasma sources, enhancing the etching uni...
5 200610007667 Plasma processing device
The present invention provides a plasma processing apparatus for suppressing arc discharge by preventing the plasma entrance into the gas hole of a showerhead even in case of applying a ...
6 200610007746 Gas supply member and plasma processing apparatus
The invention provides a gas supply device and a plasma processing plant, which can supply gas to a chamber without remaining gas. As the gas supply device, the gas introduction spray no...
7 200610007747 Plasma processing method and apparatus, and method for measuring a density of f...
In a plasma processing apparatus for plasma-processing a target object accommodated in a processing chamber, a density of fluorine F is measured while performing a plasma processing by u...
8 200610008225 Plasma processing apparatus and components thereof, and method for detecting li...
In a plasma processing apparatus capable of generating a plasma in a processing chamber accommodating therein a substrate to plasma-process the substrate, a component disposed in the pro...
9 200610008302 Plasma generation apparatus
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to...
10 200610009280 Electrode subassembly
A plasma processing system for processing a substrate is disclosed. The plasma processing system includes a process chamber within which a plasma is both ignited and sustained for proces...
11 200610009793 Gas working dielectric conversion device capable of working under bad circumsta...
A switching device of gas media enabling to be operated under adverse circumstances is prepared as setting two input ends and two output ends on timer as using input end to input control...
12 200610009796 Artificial ablation testing machine for heat isolating material floor
The invention supplies a heat preventing material ground simulating ablation test device that includes three phase AC electric arc heater, three same arc room and public mixing room. The...
13 200610011363 Atmospheric discharging cold plasma generator and array based on contraction an...
A cold plasma generator of atmosphere discharge is featured as setting flat-plate type or rotation type of contraction and enlargement channel structure at air inlet or air outlet or dis...
14 200610011364 Atmospheric radio-frequency discharging high-speed cold plasma array generator
A high velocity cold plasma array generator of atmosphere radio frequency discharge consists of cylindrical shell and generator array formed by multiple single coaxial type of cold plasm...
15 200610012139 Atmospheric pressure discharge cold plasma generator based on double gas source
The present invention belongs to atmospheric pressure discharge cold plasma generator technology field. It features said generator gas supply system adopting double gas source gas supply...
16 200610018569 Tunable plasma resonant cavity
The present invention relates to a kind of tunable plasma resonant cavity for PCVD optical fiber perform rod processing machine. The tunable plasma resonant cavity includes cylindrical r...
17 200610021444 High voltage connector for electronic accelerator
This invention provides a high voltage connection device used in electronic accelerators, which connects the high voltage supply and the electronic acceleration system, electronic acceler...
18 200610022181 System for measuring electronic beam scan uniformity
The measuring system includes data acquisition unit, microcomputer system, and data process system. Being installed under scan extraction window of accelerator, the data acquisition unit ...
19 200610028868 Portable plasma beam generator
The invention relates to a portable plasma beam generator, which comprises: plastic frame, metallic water tank inside the plastic frame, steam generator and anode nozzle. It is character...
20 200610037708 Plasma generator
A plasma generating device consists of internal and external cylinders being set coaxially and being insulated to each other .It is featured as setting through holes on wall of internal ...
21 200610044593 Built-in multi-leaf optical grating
This invention relates to a built-in multi-blade grating including two boxes fitted with dragging mechanism and relatively installed on the linear guide-rail of the base plate, in said b...
22 200610048262 Water electrode medium barrier discharge device
This invention relates to a hydropower electrode dielectric barrier discharge device. Its characteristics are: the basic structure of the discharge devices includes the two symmetrical se...
23 200610051417 Wafer holder and method of holding a wafer
A wafer holder including a wafer stage and a wafer stage outer-ring surrounding the wafer stage wherein the wafer stage has a diameter smaller than the diameter of a wafer loaded on the ...
24 200610051696 Atmospheric pressure glow discharge control method and its circuit based on pul...
Present invention discloses pulse number modulation based atmospheric pressure glow discharge control method and circuit. Control method adopts pulse density modulation to generate alter...
25 200610057675 Chamber isolation valve RF grounding
A method and apparatus for grounding a chamber isolation valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively gro...
26 200610057697 Substrate supporting member and substrate processing apparatus
The invention discloses a base for keeping the temperature of the base plate surface homogeneous, which is characterized by the following: the base (13) has the base plate retention surf...
27 200610058370 Plasma processing device
The invention relates to a plasma processing device, wherein the part with high plasma density in the processing room of said processing device is inserted with shield element, to make p...
28 200610058962 Vacuum plasma generator
The invention relates to a vacuum plasma generator (1, 1a, 60), for processing the work-piece inside the vacuum room (17), wherein it comprises: a power supply connector (2) for connecti...
29 200610063955 Modified welding torch cathode for use in roughening a surface and related meth...
A welding torch includes a torch body and a torch head, the torch head having a plurality of torch tips arranged in a dense array.
30 200610064817 Etching method and apparatus
The invention relates to a method for improving the uniformity of etches treatment on the base plate, when using the gas with carbon and halide atom to etch, wherein said method comprise...
31 200610065330 Substrate mounting table, substrate processing apparatus and substrate processi...
The invention discloses a base plate carrying table (17), which is characterized by the following: the cylindrical gap part (30) is installed between inner cold-producing medium chamber ...
32 200610065521 Plasma processing apparatus, slot antenna and plasma processing method
A microwave plasma processing apparatus includes a processing chamber, a waveguide, a slot antenna, a dielectric member, a first cooling unit and a second cooling unit. As a liquid coola...
33 200610065769 Barrier glow discharging plasma generator and generation with atmosphere medium
A atmospheric pressure medium bar glowing discharge plasma generating equipment and the method, the equipment including the electric liquid electrode and the inert gases source, the elec...
34 200610066499 Plasma processing apparatus and method
The invention relates to a plasma processor and relative method with high frequency and direct current voltage, wherein in the plasma etching device that generating the plasma for proces...
35 200610066914 Plasma processing apparatus and method
A plasma processing apparatus that passes a microwave, which is introduced into a waveguide, through a slot and propagates the microwave to a dielectric, converts a predetermined gas sup...
36 200610067029 Gas injector and apparatus including the same
A gas injector includes: a plate including at least one first injection hole; and at least one nozzle module combined with the plate, the at least one nozzle module including at least on...
37 200610067101 Plasma processing apparatus and method for using the same
The invention relates to a plasma processor and relative method, which can confirm the uniformity of plasma, wherein in the plasma etching device that generating the plasma for processin...
38 200610067412 Method for electrically discharging substrate, substrate processing apparatus a...
The present invention provides a substrate processing apparatus that executes electrical discharge processing before detaching a substrate held onto an electrostatic chuck of a lower ele...
39 200610072117 Plasma processing device and method
The provided plasma treatment device (100) with multiple gas feeding pipes (30) comprises: some gas pipes (28) with corresponding supporting bodies (27); in (27), arranging the first pat...
40 200610073360 Plasma processing apparatus
The invention relates to a plasma processor with high uniformity, in capacity couple type, wherein said plasma processor (100) comprises: a chamber (1) for keeping vacuum; the first and ...
41 200610075404 Electromagnetic wave generating device
A compact and low-cost electromagnetic wave generator in which X-rays having high intensity can be generated and the energy of generated X-rays can rapidly be switched. In an electromagn...
42 200610076024 Lamp of supply high frequency plasma flame gas stream
This invention discloses lamps and lanterns of a new structure provided to high frequency plasma flame gas flows composed of three layers of jacketed coaxial quartz tubes with gas inlets...
43 200610076036 Air supply system of shower in water cold plasma
The system includes a gas cylinder, four pneumatic valves, two pressure gauges, a pressure adjusting valve, a filter, and a mass flowmeter. The invention guarantees constant gas pressure...
44 200610082631 Plasma processing chamber, potential controlling apparatus, method, program and...
The invention relates to a plasma processing chamber (10) which comprises a covered container (11), cylinder side wall component (45) inside the container, an electric potential control ...
45 200610084697 Plasma processing device
To provide a plasma processing device in which an amount of heat generated from a power supply member is small when the power supply member is supplied with high frequency current. A sub...
46 200610084698 Substrate processing device
Disclosed is a substrate processing device (100) for holding a substrate capable of reducing damage to a peripheral member (14) when a power supply member (11,16) generates heat. The sub...
47 200610084863 Plasma chamber with discharge inducing bridge and plasma treating system using ...
There are provided a plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source includes a number of discharge inducing bridges, each ...
48 200610084998 Collecting ion in air and its device utilizing the same
The invention relates to a device for collecting and using the ion of air, wherein said device comprises: a, an air inlet device for flowing air to guide in positive and negative ions; b...
49 200610085853 High-voltage accelerating tube
This invention relates to a high voltage acceleration tube composed of multiple connection rings laminated with electrode plates clamped between adjacent two of them, in which, said elec...
50 200610085855 Magnetic prevention high-voltage accelerating tube
An anti-magnetic high voltage acceleration tube is laminated by multiple connection rings and electrode plates clamped between two adjacent connection rings, in which, said plate has a h...
51 200610087184 Microwave plasma process device, plasma ignition method, plasma forming method,...
A microwave plasma process device (10) is provided with a plasma ignition enhancing means for enhancing plasma ignition by microwaves. The plasma ignition enhancing means comprises a deut...
52 200610092245 Control method of plasma treatment device and plasma treatment device
Provided is a control method of an order of supplying gas to generate plasma uniformly. The microwave plasma treatment device 100 propagates a microwave outputted from a microwave generat...
53 200610093088 Top electrode, plasma processing device and method
The present invention provides one kind of upper electrode in cooled structure with excellent temperature control performance. The upper electrode has an electrode plate configured in pa...
54 200610093138 Electrode assembly and plasma processing apparatus
An electrode assembly of a plasma processing apparatus that enables damage to an electrode plate to be prevented, and enables an increase in the number of parts to be prevented so that a ...
55 200610094539 Controlled fusion in a field reversed configuration and direct energy conversion
A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, p...
56 200610096902 Apparatus for measuring entrance phase position of Tokamak low-noise-wave anten...
The invention discloses a phase-measuring device and identification method to entrance Tokamak low clutter antenna phase. That is to connect a dual directional coupler respectively at the...
57 200610097531 A longitudinal pressure divider at the body of electronic accelerator
The invention relates to a main body longitudinal divider of electric accelerator. Wherein, it comprises two couples of insulated posts, while each couple have several dividing plates bet...
58 200610099590 Plasma etching apparatus
The present invention relates to a plasma etching apparatus, and provides a plasma etching apparatus comprising a substrate support on which a substrate is seated; an electrode disposed c...
59 200610103975 Plasma etching apparatus
The present invention relates to a plasma etching apparatus, which comprises a chamber, a substrate support disposed inside the chamber to support a substrate, a shield disposed with a ga...
60 200610104220 Processing chamber, flat display device production device, plasma treatment met...
Provided is a processing chamber, flat display device production device, used for generating plasma in the interior and processing at least one substrate. The structure of the processing ...
61 200610106324 Apparatus to treat a substrate
An apparatus to treat a substrate includes a processing chamber including a reaction space where a substrate to be treated is placed and a plasma is formed, a ferrite core having a plural...
62 200610106329 Inductively coupled plasma processing apparatus
An inductively coupled plasma processing apparatus is disclosed. The inductively coupled plasma processing apparatus includes a reaction chamber, a substrate holder for forming a plasma s...
63 200610115467 Inductively coupled plasma alignment apparatus and method
An inductively coupled plasma alignment apparatus having a coil (10) for generating an inductively coupled plasma in a gas, the coil having a first axis (100); a torch (20) passing at lea...
64 200610118104 An atomic beam source of DC discharge
The related dc discharge atomic beam source for thin-film material synthesis comprises: a cathode inserted in lower end of a cathode base, a hollow anode with pin end as atomic beam leadi...
65 200610132020 Torch
The present invention relates to torch used for processing metal. The torch comprises an electromagnetic valve mechanism which includes a base which has a vertically piercing gas through ...
66 200610140073 Capacity coupling plasma reactor with temperature uniform distribution wafer su...
A plasma reactor device for processing workpieces includes a reaction chamber, an electrostatic chuck for holding a workpiece inside the chamber, a RF plasma bias power generator coupled ...
67 200610141294 Apparatus and method for treating a substrate with plasma, and facility for man...
A plurality of different types of plasma sources are used to treat a substrate. The plasma sources may be associated with a single process chamber. In this case, the plasma sources are se...
68 200610141520 Adjustable electrode assembly for use in processing substrates of differing wid...
An electrode assembly for use in a plasma processing system includes removable rails that are adjustable for reconfiguring the electrode to accommodate substrates of different widths. The...
69 200610141849 Dry etching method
A main etching step is effected in a state under a first pressure using a gas containing at least HBr, e.g., a mixture gas of HBr and Cl2 as an etching gas. The main etching is ended befo...
70 200610143929 Plasma processing apparatus
The purpose of the present invention is to provide homogeneous plasma in longitudinal direction of a plasma processing apparatus applicable to multiple processes. A microwave waveguide 10...
71 200610149979 Electron beam accelerator and ceramic stage with electrically-conductive layer ...
A ceramic electron beam accelerator is disclosed finding particularly efficacious uses in X-ray electronic circuit imaging and testing applications. The ceramic stage design eliminates th...
72 200610150519 Independent control of ion density, energy distribution and dissociation in a p...
A method of processing a workpiece in a plasma reactor includes coupling RF power from at least three RF power source of three respective frequencies to plasma in the reactor, setting ion...
73 200610151339 Plasma torch with interchangeable electrode systems
A plasma torch is provided, comprising a first electrode holder configured to be received by the plasma torch and adapted to cut a thinner workpiece. The first electrode holder is configu...
74 200610151453 Particle sticking prevention apparatus and plasma processing apparatus
In order to prevent particles within a unit from sticking to a substrate in a substrate processing process, an ion generator charges the particles. At the same time, a direct current volt...
75 200610154446 Synchronous gas-liquid purifying high voltage DC/pulse discharge method and dev...
The present invention discloses synchronous gas-liquid purifying high voltage DC/pulse discharge method and device. After waste gas and waste liquid is fed to the gas-liquid plasma genera...
76 200610159201 Electrostatically clamped edge ring for plasma processing
A coupling ring assembly including an edge ring supported by an electrostatic edge ring chuck and a method of improving the temperature control of an edge ring in a plasma processing cham...
77 200610159307 Plasma accelerator
A plasma accelerator is provided. The plasma accelerator includes a chamber having a closed top, an opened bottom and a lateral surface, a first coil section comprising a plurality of coi...
78 200610159359 Plasma processing chamber
The present invention provides a plasma treatment chamber (10) which can detect the state of particles inside a container regardless of the pressure in the container. The plasma treatment...
79 200610166481 Independent power supply device for electronic gun
The invention discloses an independent power unit for electronic gun, specifically supplying power for the electron gun of electronic accelerator. It contains the motor, electrical genera...
80 200610166483 Beam flow baffle plate pushing mechanism
The invention discloses a beam baffle promotion device, which contains titanium window with horizontal ribs on both sides and guideways under both bottoms. There is beam baffle between tw...
81 200610166484 Semi underground debugging test pit for electronic accelerator
The invention discloses an electronic accelerator semi-underground testing experimental pit, which consists of the underground and aboveground parts. The cylinder underground part is pour...
82 200610168415 First wall component with ring segment
The invention relates to a first-wall component of a fusion reactor, which comprises at least one heat shield of a graphitic material and a cooling tube of copper or a copper alloy. Arran...
83 200610168588 Plasma arc torch, and methods of assembling and disassembling a plasma arc torch
A plasma arc torch and methods for assembling and disassembling a plasma arc torch wherein a plurality of front end parts of the torch form a unit that is removable from the torch in a si...
84 200610168857 Copper alloy heatsink
The invention relates to a first wall component for a nuclear fusion reactor, comprising at least a heat shield made of materials selected from graphite, carbide, tungsten and tungsten al...
85 200610170533 Apparatus for processing substrate with atmospheric pressure plasma
The invention provides an apparatus for generating a plasma under atmospheric prssure and supplying the plasma. The apparatus includes a shell where gas is guided in and a plasma generati...
86 200610171233 Method and device for detecting arcs
An arc detection means for detecting arcs in a plasma process includes at least one comparator to which an evaluation signal such as an output signal or an internal signal of an AC genera...
87 200610200528 Substrate electrod tunning type radio-frequency sensitive coupling plasma source
Characters of the invention are that the plasma source includes following parts: up vacuum chamber, low vacuum chamber, substrate electrodes, external tuning network, and antenna in radi...
88 200610200529 Plane Faraday screening system of radio frequency inductive coupled plasma sour...
The invention discloses a plane Faraday shielding system for restraining the parasitic capacitive coupling during discharge of the RF inductive coupling. The characteristic is that it
89 200610200605 Double hole type atmos glow discharge low-temp plasma source
This invention relates to a gas discharge low temperature plasma source, especially to a double-hole glow-discharge low temperature plasma source device, in which, a hollow column high v...
90 200510000398 Plasma processing method and apparatus
The present invention provides a plasma processing method capable of enhancing the accuracy of prediction or the like of a processing result by a plasma processing apparatus, and relievin...
91 200510002966 Inductive coupling coil and inductive coupling plasma apparatus thereof
This invented inductance couple coil is formed by an inner coil set connected with an outer coil set, one of which is composed of two parallel coils in different diameters in which, this...
92 200510008769 Plasma antenna
The plasma antenna is designed to allow connection between electric elements within the antenna to be varied without changing the construction of the antenna during a chemical vapor depo...
93 200510008776 Inductance coupled coil and inductance coupled plasma device
The invention is an inductance coupling coil, nested of two groups of involute coils, where the involute coil can be a segment of involute, or composed of inner and outer coils of an inv...
94 200510011372 Method for uniform glow discharge in atmosphere air
This invention relates to a method for realizing uniform glow-discharge in air under the atmospheric pressure, which utilizes an additive plasma source without circuit connection with th...
95 200510011398 Coaxial low-temp plasma material processor
A coaxial low temperature plasma material processor includes a coaxial integrated discharge and material process cavity, an inner electrode, an outer electrode, a water circulation cooli...
96 200510012217 Method for modulating radio frequency four polar field accelerator
This invention provides a modulatioin method for RFQ accelerators including: after beams enter into the radial matched section of a RFQ accelerator, the parameter of the beam of a shaped ...
97 200510014266 Hollow electrode structure including multi-hole and plasma polymerization proce...
The invention relates to a hollow pole structure with several holes and the plasma polymerization treating device with the structure above. It includes the first and the second pole. The ...
98 200510018418 Plasma resonant cavity tunable waveguide device
This invention refers to the tunable wave-guide device of plasma resonant cavity for PCVD optical fiber fabricated bar working machine, which contains vertical crossed two-section wave-gu...
99 200510019473 Method and apparatus for polishing large-scale diamond membrane
A method and an equipment for extended diamond film polishing. It includes such steps as follows: produce electron cyclotron resonance plasm by microwave stimulating；high-frequency pow...
100 200510025733 X-ray human body safety check apparatus
The present invention relates to a X-ray human body safety examination equipment. It includes a X-ray generator, a X-ray receiving device opposite to said X-ray generator and an image pr...
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